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首页> 外文期刊>Physica, B. Condensed Matter >Anomalous Hall effect in Cu and Fe codoped In2O3 and ITO thin films
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Anomalous Hall effect in Cu and Fe codoped In2O3 and ITO thin films

机译:铜和铁共掺杂的In2O3和ITO薄膜中的异常霍尔效应

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We present a systematic study of the structure, magnetization, resistivity, and Hall effect proper-ties of pulsed laser deposited Fe- and Cu-codoped In2O3 and indium-tin-oxide (ITO) thin films. Both the films show a clear ferromagnetism and anomalous Hall effect at 300 K. The saturated magnetic moments are almost the same for the two samples, but their remanent moments M, and coercive fields H-C are quite different. M, and H-C values of ITO film are much smaller than that of In2O3. The ITO sample shows a typical semiconducting behavior in whole studied temperature range, while the In2O3 thin film is metallic in the temperature range between 147 and 285 K. Analysis of different conduction mechanisms suggest that charge carriers are not localized in the present films. The profile of the anomalous Hall effect vs. magnetic field was found to be identical to the magnetic hysteresis loops, indicating the possible intrinsic nature of ferromagnetism in the present samples.
机译:我们对脉冲激光沉积的Fe和Cu共掺杂的In2O3和铟锡氧化物(ITO)薄膜的结构,磁化强度,电阻率和霍尔效应性质进行了系统的研究。这两部影片在300 K时均表现出清晰的铁磁性和霍尔效应。两个样品的饱和磁矩几乎相同,但其剩余磁矩M和矫顽场H-C却大不相同。 ITO膜的M和H-C值比In2O3小得多。 ITO样品在整个研究的温度范围内均表现出典型的半导体行为,而In2O3薄膜在147至285 K的温度范围内为金属。不同传导机制的分析表明,电荷载流子未局限在本膜中。发现异常霍尔效应与磁场的关系与磁滞回线相同,表明本样品中铁磁性的可能固有性质。

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