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首页> 外文期刊>Physica, B. Condensed Matter >Vanadium-induced deep impurity level in Pb_(1-x)Sn_xTe
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Vanadium-induced deep impurity level in Pb_(1-x)Sn_xTe

机译:钒诱导的Pb_(1-x)Sn_xTe中深杂质水平

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The galvanomagnetic properties (T=4.2–300 K, B≤0.08 T) of Pb_(1-x-y)Sn_xV_yTe alloys (x=0.06-0.26,y=0.002-0.066) have been investigated. Low temperature activation range of the impurity conductivity on the temperature dependencies of resistivity r and of the Hall coefficient R_H in the heavily doped samples has been revealed and attributed to the appearance of vanadium-induced deep level in the gap of the alloys. It was found that in insulating phase alloys possess a high photosensitivity to IR excitation at temperatures up to TcE40 K. In the alloy with xE0.2 the metal-insulator transition due to the shift of the Fermi level from the valence band to the gap with the increase of the vanadium and tin content and the pinning of the Fermi level by vanadium level were observed. The diagram of electronic structure reconstruction for Pb_(1-x-y)Sn_xV_yTe alloys was proposed.
机译:研究了Pb_(1-x-y)Sn_xV_yTe合金(x = 0.06-0.26,y = 0.002-0.066)的电磁性能(T = 4.2–300 K,B≤0.08T)。现已揭示出重掺杂样品中杂质电导率与电阻率r和霍尔系数R_H的温度相关性的低温活化范围,这归因于合金间隙中钒引起的深能级的出现。发现在绝缘相中,合金在高达TcE40 K的温度下对IR激发具有很高的光敏性。在xE0.2的合金中,由于费米能级从价带到能隙的转变,金属-绝缘体跃迁。观察到钒和锡含量的增加以及费米能级被钒能级固定。提出了Pb_(1-x-y)Sn_xV_yTe合金的电子结构重建图。

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