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High-resolution TEM study of the Er distribution in Er-doped SiO2 films prepared by laser ablation

机译:激光烧蚀制备掺Er SiO2薄膜中Er分布的高分辨率TEM研究

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摘要

High-resolution TEM was used to study the Er distribution and the formation of Si nanocrystallites in Er-doped SiO2 films fabricated by laser ablation. Formation of Er nanoparticles up to 40 nm in diameter were observed and characterised.
机译:用高分辨率TEM研究了激光烧蚀制备的掺Er的SiO2薄膜中的Er分布和Si纳米微晶的形成。观察并表征了直径高达40 nm的Er纳米颗粒的形成。

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