...
首页> 外文期刊>Physical chemistry chemical physics: PCCP >Ordered mesoporous silica films with pores oriented perpendicular to a titanium nitride substrate
【24h】

Ordered mesoporous silica films with pores oriented perpendicular to a titanium nitride substrate

机译:有序介孔二氧化硅膜,其孔垂直于氮化钛基板

获取原文
获取原文并翻译 | 示例
           

摘要

The production of thin mesoporous silica films with small (similar to 2-3 nm) pores oriented perpendicular to a titanium nitride growth surface is demonstrated using two methods. These are the growth from a Stober silica solution with surfactant ordering at the surface of the electrode, and electrochemically assisted growth from an acidic sol achieved by polarisation of the electrode surface. The thickness, pore order and pore size that can be achieved with these two methods is contrasted. A number of methods to vary the pore size by using different surfactants and swelling agents are explored. The advantage of applying these growth methods on titanium nitride surfaces is that it provides access to a wider electrochemical window for nanowire growth and sensor applications with non-aqueous electrolytes whilst retaining good film growth and adhesion properties.
机译:使用两种方法证明了具有垂直于氮化钛生长表面取向的细孔(类似于2-3 nm)的中孔二氧化硅薄膜的生产。这些是从表面活性剂在电极表面有序排列的斯托伯二氧化硅溶液的生长,以及由电极表面极化实现的酸性溶胶的电化学辅助生长。对比了这两种方法可以达到的厚度,孔序和孔径。探索了许多通过使用不同的表面活性剂和溶胀剂来改变孔径的方法。在氮化钛表面上使用这些生长方法的优点是,它为纳米线生长和非水电解质传感器应用提供了更宽的电化学窗口,同时又保持了良好的膜生长和粘附性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号