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Theory of nitride oxide adsorption on transition metal (111) surfaces: a first-principles investigation

机译:过渡金属(111)表面上氮氧化物吸附的理论:第一性原理研究

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In this work, we report a density functional theory study of nitric oxide (NO) adsorption on close-packed transition metal (TM) Rh(111), Ir(111), Pd(111) and Pt(111) surfaces in terms of adsorption sites, binding mechanism and charge transfer at a coverage of Θ_(NO) = 0.25, 0.50, 0.75 monolayer (ML). Based on our study, an unified picture for the interaction between NO and TM(111) and site preference is established, and valuable insights are obtained. At low coverage (0.25 ML), we find that the interaction of NO/TM(111) is determined by an electron donation and back-donation process via the interplay between NO 5σ/2π* and TM d-bands. The extent of the donation and back-donation depends critically on the coordination number (adsorption sites) and TM d-band filling, and plays an essential role for NO adsorption on TM surfaces. DFT calculations shows that for TMs with high d-band filling such as Pd and Pt, hollow-site NO is energetically the most favorable, and top-site NO prefers to tilt away from the normal direction. While for TMs with low d-band filling (Rh and Ir), top-site NO perpendicular to the surfaces is energetically, most favorable. Electronic structure analysis show that irrespective of the TM and adsorption site, there is a net charge transfer from the substrate to the adsorbate due to overwhelming back-donation from the TM substrate to the adsorbed NO molecules. The adsorption-induced change of the work function with respect to bare surfaces and dipole moment is however site dependent, and the work function increases for hollow-site NO, but decreases for top-site NO, because of differences in the charge redistribution. The interplay between the energetics, lateral interaction and charge transfer, which is element dependent, rationalizes the structural evolution of NO adsorption on TM(111) surfaces in the submonolayer regime.
机译:在这项工作中,我们报告了密闭过渡金属(TM)Rh(111),Ir(111),Pd(111)和Pt(111)表面上一氧化氮(NO)吸附的密度泛函理论研究。的吸附位,结合机理和电荷转移,覆盖Θ_(NO)= 0.25、0.50、0.75单层(ML)。根据我们的研究,建立了NO和TM(111)与站点偏好之间相互作用的统一图片,并获得了有价值的见解。在低覆盖率(0.25 ML)下,我们发现NO / TM(111)的相互作用是通过NO5σ/2π*与TM d谱带之间的相互作用由电子捐赠和反捐赠过程决定的。捐赠和回赠的范围主要取决于配位数(吸附位点)和TM d波段填充,并且对于NO在TM表面的吸附起着至关重要的作用。 DFT计算表明,对于具有高d波段填充的TM(例如Pd和Pt),从能量上来说,中空位NO最有利,而顶部位NO更倾向于远离法线方向倾斜。对于低d波段填充的TM(Rh和Ir),垂直于表面的顶部位NO在能量上最有利。电子结构分析表明,与TM和吸附位点无关,由于从TM底物到吸附的NO分子的大量反向捐赠,从底物到吸附物的净电荷转移。然而,相对于裸露表面和偶极矩,由吸附引起的功函数的变化取决于位置,并且由于电荷重新分布的差异,功函数对于空心位NO增加,而对于顶部位NO则减小。高能,横向相互作用和电荷转移之间的相互作用(取决于元素)使亚单分子层体系中TM(111)表面上NO的吸附结构合理化。

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