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NMR chemical shifts of trace impurities: Common laboratory solvents, organics, and gases in deuterated solvents relevant to the organometallic chemist

机译:痕量杂质的NMR化学位移:与有机金属化学家相关的氘代溶剂中的常见实验室溶剂,有机物和气体

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Tables of ~1H and ~(13)C NMR chemical shifts have been compiled for common organic compounds often used as reagents or found as products or contaminants in deuterated organic solvents. Building upon the work of Gottlieb, Kotlyar, and Nudelman in the Journal of Organic Chemistry, signals for common impurities are now reported in additional NMR solvents (tetrahydrofuran-d_8, toluene-d_8, dichloromethane-d _2, chlorobenzene-d_5, and 2,2,2-trifluoroethanol-d _3) which are frequently used in organometallic laboratories. Chemical shifts for other organics which are often used as reagents or internal standards or are found as products in organometallic chemistry are also reported for all the listed solvents.
机译:对于常见的有机化合物,〜1H和〜(13)C NMR化学位移表已被整理,这些化合物通常用作试剂或在氘代有机溶剂中用作产物或污染物。基于Gottlieb,Kotlyar和Nudelman在《有机化学杂志》上的工作,现在在其他NMR溶剂(四氢呋喃-d_8,甲苯-d_8,二氯甲烷-d _2,氯苯-d_5和2, 2,2-三氟乙醇-d _3),通常在有机金属实验室中使用。对于所有列出的溶剂,也报告了通常用作试剂或内标或在有机金属化学中发现的其他有机物的化学位移。

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