首页> 外文期刊>Organometallics >Surface Organometallic Chemistry of Hf(CH(2)tBu)(4) on Silica and Silica-Alumina: Reaction of the Resulting Grafted Hafnium Neopentyl with Dihydrogen
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Surface Organometallic Chemistry of Hf(CH(2)tBu)(4) on Silica and Silica-Alumina: Reaction of the Resulting Grafted Hafnium Neopentyl with Dihydrogen

机译:Hf(CH(2)tBu)(4)在二氧化硅和二氧化硅-氧化铝上的表面有机金属化学:接枝的Neo新戊基与二氢的反应

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摘要

[Hf(CH(2)tBu)(4)], t, has been found to react at room temperature with an aerosil silica dehydroxylated at different temperatures theta (theta = 800, 500, 200 degrees C) to give a modified surface referred to as 1/SiO2-(theta) and with a silica-alumina to give a modified surface referred to as 1/SiO2-Al2O3-(500). With SiO2-(800) a single-site monosiloxy surface complex [( SiO)Hf(CH(2)tBu)(3)], 1/SiO2-(800), is obtained. Contrarily, with 1/SiO2-(500) a monosiloxy 1/SiO2-(500) and a bis-siloxy surface complex [( SiO)(2)Hf(CH(2)tBu)(2)], 2-SiO2-(500), are formed in a ratio of 70%:30%. With SiO2-(200), there is mainly the formation of the bis-siloxy surface complex (up to 90%) but in different local environments: ( SiO)(2)Hf(CH(2)tBu)(2), 2-SiO2-(200), and ( SiO)(2)( SiOH)Hf(CH(2)tBu)(2)], 2'-SiO2-(200). Finally with SiO2-Al2O3-(500), two major neutral surface complexes are formed: the monosiloxy 1-SiO2-Al2O3-(500) and the bisiloxy 2-SiO2-Al2O3-(500), as well as a third complex, 3, which is not as well-defined and may be cationic. Under hydrogen at 150 degrees C, 17 h, both modified surface 1/SiO2-(theta) and 1/SiO2-Al2O3-(500) afford the same surface hydrides but in different proportion and diverse surface "local environments". The formation of these hydrides is concomitant with the formation of [( SiO)(2)Si(H)(2)] and [( SiO)(3)SiH]. With 1/SiO2-Al2O3-(500), the formation of [( SiO)(n)AlH] is also observed. The major surface hydride in the hydrogenolysis of 1/SiO2-(800), 1/SiO2-(500), and 1/SiO2-Al2O3-(500) is ( SiO)(2)Hf(H)(2), whereas in the hydrogenolysis of 1/SiO2-(200) ( SiO)(3)Hf(H) forms preferentially. All these alkyl and hydride surface complexes have been fully characterized by elemental analysis, labeling experiments, infrared, H-1/C-13 solid-state NMR, and H-1 DQ solid-state NMR.
机译:已发现[Hf(CH(2)tBu)(4)] t在室温下与在不同温度theta(theta = 800,500,200℃)下脱羟基的硅氧二氧化硅反应,得到改性的表面制成1 / SiO 2-θ,并用二氧化硅-氧化铝制成改性表面,称为1 / SiO 2 -Al 2 O 3-(500)。用SiO 2-(800)获得单中心单甲硅烷氧基表面配合物[(SiO 2)Hf(CH(2)tBu)(3)],1 / SiO 2-(800)。相反,对于1 / SiO2-(500),单甲硅烷氧基1 / SiO2-(500)和双甲硅烷氧基表面配合物[(SiO)(2)Hf(CH(2)tBu)(2)],2-SiO2- (500)的比例为70%:30%。使用SiO2-(200),主要形成双甲硅烷氧基表面配合物(高达90%),但在不同的局部环境中:(SiO)(2)Hf(CH(2)tBu)(2),2 -SiO2-(200)和(SiO)(2)(SiOH)Hf(CH(2)tBu)(2)],2′-SiO2-(200)。最终,使用SiO2-Al2O3-(500),形成了两个主要的中性表面配合物:单甲硅烷氧基1-SiO2-Al2O3-(500)和双甲硅烷氧基2-SiO2-Al2O3-(500),以及第三种配合物3 ,定义不明确,可能是阳离子的。在150摄氏度的氢气中17小时,改性的表面1 /SiO2-θ和1 / SiO2-Al2O3-(500)均提供相同的表面氢化物,但比例不同且表面“局部环境”不同。这些氢化物的形成与[(SiO)(2)Si(H)(2)]和[(SiO)(3)SiH]的形成同时发生。用1 / SiO 2 -Al 2 O 3-(500),也观察到[(SiO)(n)AlH]的形成。 1 / SiO2-(800),1 / SiO2-(500)和1 / SiO2-Al2O3-(500)的氢解反应中的主要表面氢化物是(SiO)(2)Hf(H)(2),而1 / SiO2-(200)的氢解反应中,优先形成(SiO)(3)Hf(H)。所有这些烷基和氢化物表面配合物已通过元素分析,标记实验,红外,H-1 / C-13固态NMR和H-1 DQ固态NMR进行了全面表征。

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