Previous research on making low-stray-light gratings is mainly focused on process steps after the photoresist mask has been made. We propose to improve the quality of the photoresist mask directly in exposure. We present a broad-beam scanning exposure method along the grating vector (i.e., in the direction perpendicular to the grating grooves), utilizing a reference grating clamped below the substrate on the translation stage for phase and attitude locking. Scanning-exposed gratings with a size of 40 mm x 40 mm are successfully made, which have straighter grooves and smoother surfaces, and their stray light levels around the first and second diffraction orders are decreased significantly. (C) 2015 Optical Society of America
展开▼
机译：先前关于制造低杂散光光栅的研究主要集中在光致抗蚀剂掩模制成后的工艺步骤上。我们建议直接在曝光中提高光刻胶掩模的质量。我们提出了一种沿光栅矢量的宽光束扫描曝光方法（即在垂直于光栅凹槽的方向上），利用在平移台上夹在基板下方的参考光栅进行相位和姿态锁定。成功制造出尺寸为40 mm x 40 mm的扫描曝光光栅，它们具有更直的凹槽和更光滑的表面，并且它们在第一和第二衍射级附近的杂散光水平显着降低。 （C）2015年美国眼镜学会
展开▼
