Experimental demonstration of ultracompact air hole photonic crystal ring resonator fabricated on silicon-on-insulator wafer

摘要

A photonic crystal ring resonator (PCRR) of air hole arrays is fabricated on a silicon-on-insulator wafer by using electron-beam lithography and inductively coupled plasma etching. The designed PCRR is modeled and its performance is simulated by the two-dimensional finite difference time domain method. The simulation results show that the PCRR has two resonant wavelengths, 1598 and 1606 nm, and their corresponding quality factors are 3994 and 4015, respectively. A sample of the PCRR structure is fabricated and tested by the established experimental setup. Compared with the simulation results, the experimental resonant wavelengths drift to some extent and the quality factors are reduced by about one order of magnitude. The fabrication error and irregularity are the main reasons for the above results, which can be further reduced by improving the process technology. In addition, one more resonant wavelength emerged for the PCRR sample, which can be attributed to the change of the coupling strength.