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Toward two-dimensional nanometer resolution hard X-ray differential-interference-contrast imaging using modified photon sieves

机译:改进的光子筛在二维纳米分辨率硬X射线微分干涉对比成像中的应用

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In this Letter, we report a significant step forward in the design of single-optical-element optics for two-dimensional (2D) hard X-ray differential-interference-contrast (DIC) imaging based on modified photon sieves (MPSs). MPSs were obtained by a modified optic, i.e., combining two overlaid binary gratings and a photon sieve through two logical XOR operations. The superior performance of MPSs was demonstrated. Compared to Fresnel zone plates-based DIC diffractive optical elements (DOEs), which help to improve contrast only in one direction, MPSs can provide better resolution and 2D DIC imaging. Compared to normal photon sieves, MPSs are capable of imaging at a significantly higher image contrast. We anticipate that MPSs can provide a complementary and versatile high-resolution nondestructive imaging tool for ultra-large-scale integrated circuits at 45 nm node and below.
机译:在这封信中,我们报告了基于改进的光子筛(MPS)的二维(2D)硬X射线微分干涉对比(DIC)成像单光学元件光学设计的重要进展。 MPS是通过改良的光学器件获得的,即通过两个逻辑XOR运算将两个重叠的二进制光栅和一个光子筛组合在一起。展示了MPS的卓越性能。与基于菲涅耳波带片的DIC衍射光学元件(DOE)仅有助于改善一个方向的对比度相比,MPS可以提供​​更好的分辨率和2D DIC成像。与普通的光子筛相比,MPS能够以明显更高的图像对比度成像。我们预计MPS可以为45 nm节点及以下的超大规模集成电路提供互补且通用的高分辨率无损成像工具。

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