首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Consequences of Anode Interfacial Layer Deletion. HCl-Treated ITO in P3HT:PCBM-Based Bulk-Heterojunction Organic Photovoltaic Devices
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Consequences of Anode Interfacial Layer Deletion. HCl-Treated ITO in P3HT:PCBM-Based Bulk-Heterojunction Organic Photovoltaic Devices

机译:阳极界面层删除的后果。 P3HT:基于PCBM的体-异质结有机光伏器件中的HCl处理ITO

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摘要

In studies to simplify the fabrication of bulk-heterojunction organic photovoltaic (OPV) devices, it was found that when glass/tin-doped indium oxide (ITO) substrates are treated with dilute aqueous HCl solutions, followed by UV ozone (UVO), and then used to fabricate devices of the structure glass/ITO/P3HT:PCBM/LiF/Al, device performance is greatly enhanced. Light-to-power conversion efficiency (Eff) increases from 2.4% for control devices in which the ITO surface is treated only with UVO to 3.8% with the HCl t UVO treatment-effectively matching the performance of an identical device having a PEDOT:PSS anode interfacial layer. The enhancement originates from increases in VOC from 463 to 554 mV and FF from 49% to 66%. The modified-ITO device also exhibits a 4 enhancement in thermal stability versus an identical device containing a PEDOT:PSS anode interfacial layer. To understand the origins of these effects, the ITO surface is analyzed as a function of treatment by ultraviolet photoelectron spectroscopy work function measurements, X-ray photoelectron spectroscopic composition analysis, and atomic force microscopic topography and conductivity imaging. Additionally, a diode-based device model is employed to further understand the effects of ITO surface treatment on device performance.
机译:在简化大体积异质结有机光伏(OPV)器件制造的研究中,发现在玻璃/锡掺杂的氧化铟(ITO)衬底上用稀HCl溶液处理,然后用UV臭氧(UVO)处理,以及然后用于制造玻璃/ ITO / P3HT:PCBM / LiF / Al结构的器件,器件性能大大提高。对于仅用UVO处理ITO表面的控制设备,光功率转换效率(Eff)从2.4%提高到使用HCl t UVO处理的3.8%,有效地匹配了具有PEDOT:PSS的相同设备的性能阳极界面层。增强源自VOC从463 mV增加到554 mV,FF从49%增加到66%。与包含PEDOT:PSS阳极界面层的相同器件相比,改进型ITO器件的热稳定性也提高了4倍。为了了解这些效应的起源,通过紫外线光电子能谱功函数测量,X射线光电子能谱成分分析以及原子力显微镜形貌和电导率成像来分析ITO表面作为处理的功能。另外,采用基于二极管的器件模型来进一步了解ITO表面处理对器件性能的影响。

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