From Repulsion to Attraction and Back to Repulsion: The Effect of NaCl, KCl, and CsCl on the Force between Silica Surfaces in Aqueous Solution

摘要

The force between silica surfaces in NaCl, KCl and CsCl aqueous solutions is Studied at pH 5.5 using an atomic force microscope (AFM). As ion concentration is increased, more cations adsorb to the negatively charged silica, gradually neutralizing the surface charge, hence, suppressing the electrostatic double layer repulsion and revealing van der Waals attraction. At even higher salt concentrations, repulsion reemerges due to surface charge reversal by excess adsorbed cations. Adsorption grows monotonically with cation radius. At pH 5.5 the smallest ion, Na+, neutralizes the Surface at 0.5-1 M, K+ at 0.2-0.5 M, and Cs+ at similar to 0.1 M. Titration with HCl to pH 4.0 shifts surface neutralization and charge reversal to lower salt concentrations compared with pH 5.5. When attraction dominates, the force curves are practically identical for the three salts, independent of their concentration.