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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Thermally Induced Radical Hydrosilylation for Synthesis of C18 HPLC phases from Highly Condensed SiH Terminated Silica Surfaces
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Thermally Induced Radical Hydrosilylation for Synthesis of C18 HPLC phases from Highly Condensed SiH Terminated Silica Surfaces

机译:热诱导的自由基氢硅烷化反应,可从高浓度SiH封端的二氧化硅表面合成C18 HPLC相

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Silicon hydride terminated silica surfaces were prepared at high temperatures by a chlorination-reduction sequence. SiH groups are desired for further surface modification as an alternative to the native silanol groups which are unfavorable for RPLC applications. Only few silanol groups remain in these materials and mostly SiH moieties with the highest degree of cross-linking are obtained. The retention properties of basic analytes on the SiH terminated material confirm that the surfaces is mostly free of silanols and that therefore the remaining SiOH groups are bulk species. A reagentless, radical initiated hydrosilylation reaction is introduced for the functionalization of the hydride terminated surface with 1-octadecene. 13C CP/MAS NMR and DRIFT spectroscopy demonstrate the reaction of the carboncarbon double bond and the SiH group as well as the linkage of C18 groups to the silica surface. These novel C18 materials show promising performance in RPLC separation, especially for the separation of organic bases.
机译:氢化硅封端的二氧化硅表面是在高温下通过氯化还原步骤制备的。需要SiH基团以进行进一步的表面改性,以替代天然的硅醇基团,而这对于RPLC应用是不利的。这些材料中只剩下很少的硅烷醇基团,并且大多数是具有最高交联度的SiH部分。碱性分析物在SiH封端的材料上的保留特性证实表面大部分不含硅烷醇,因此剩余的SiOH基团为本体物质。引入无试剂的自由基引发的氢化硅烷化反应,以用1-十八烯官能化氢化物封端的表面。 13 C CP / MAS NMR和DRIFT光谱证明了碳碳双键与SiH基团的反应以及C18基团与二氧化硅表面的键合。这些新颖的C18材料在RPLC分离中表现出令人鼓舞的性能,特别是在分离有机碱方面。

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