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Design and Electrochemical Fabrication of Gold Binary Ordered Micro/Nanostructured Porous Arrays via Step-by-Step Colloidal Lithography

机译:逐步胶体光刻法设计金二元有序微/纳米结构多孔阵列及其电化学制备

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摘要

Colloidal lithography is a low-cost, high-throughput, facile nanofabrication technique capable of producing a large variety of nanostructured arrays. In this letter, we report a methodology, named step-by-step colloidal lithography, using electrochemical deposition as a fabrication technique to sculpture various hexagonally packed 2D-ordered gold binary microanostructured porous arrays. By the designed fabrication routes, the structures of arrays and the morphology of the building blocks in the arrays can be easily controlled. Because of the feature of step-by-step fabrication, such a strategy will provide a versatile methodology not only for unitary components but also for binary and even multiplex materials, leading to heterostructured arrays with controlled compositions and block sizes. Such morphology and structure-controlled 2D binary porous arrays will exhibit the importance in building microanostructured devices.
机译:胶体光刻技术是一种低成本,高通量的便捷纳米制造技术,能够生产多种纳米结构阵列。在这封信中,我们报告了一种称为分步胶体光刻的方法,该方法使用电化学沉积作为制造技术来雕刻各种六角堆积的二维二维金纳米微/纳米结构多孔阵列。通过设计的制造路线,可以容易地控制阵列的结构和阵列中构件的形态。由于分步制造的特点,这种策略不仅为单一部件提供了一种通用的方法,而且为二元甚至多重材料提供了一种通用的方法,从而导致了具有可控成分和块尺寸的异质结构阵列。这种形态和结构受控的2D二元多孔阵列将在构建微/纳米结构器件中发挥重要作用。

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