首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Molecular layer deposition of poly(p-phenylene terephthalamide) films using terephthaloyl chloride and p-phenylenediamine
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Molecular layer deposition of poly(p-phenylene terephthalamide) films using terephthaloyl chloride and p-phenylenediamine

机译:使用对苯二甲酰氯和对苯二胺对聚对苯二甲酰对苯二胺薄膜进行分子层沉积

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Ultrathin polymer films can be fabricated using the gas-phase method known as molecular layer deposition. This process typically uses bifunctional monomers in a sequential, self-limiting reaction sequence to grow conformal polymer films with molecular layer control. In this study, terephthaloyl chloride (TC) and p-phenylenediamine (PD) were used as the bifunctional monomers to deposit poly(p-phenylene terephthalamide) (PPTA) thin films. 3-Aminopropyl trimethoxysilane or ethanolamine was used to prepare amine-terminated surfaces prior to the PPTA MLD. The surface chemistry and growth rate during PPTA MLD at 145 degrees C were studied using in situ transmission Fourier transform infrared (FTIR) spectroscopy experiments on high surface area powders of SiO2 particles. PPTA MLD thin film growth at 145 degrees C was also examined using in. situ transmission FTIR experiments on flat KBr substrates with an amine-terminated Al2O3 ALD overlayer. The integrated absorbances of the N-H and amide I stretching vibrations were measured and used to estimate the thin film thickness. X-ray reflectivity (XRR) experiments were also employed to measure the film thickness after PPTA MLD at 145 degrees C and 180 degrees C. The experiments. revealed that the TC and PD reactions displayed self-limiting surface chemistry. The surface species alternated with sequential TC and PD exposures and the PPTA MLD films grew continuously. However, the growth rates per MLD cycle at 145 degrees C were less than expectations based on the size of the molecules involved in the reaction chemistry and were variable between 0.5 and 4:0 angstrom per TC/PD reaction cycle. The lower growth rates are explained by the growth of a limited number of polymer chains on the substrate. The variability in the growth rate is attributed to the difficulties with the bifunctional monomer precursors. Alternative surface chemistries for polymer MLD are proposed that would avoid the use of bifunctional monomers.
机译:可以使用称为分子层沉积的气相方法制造超薄聚合物膜。该方法通常在顺序的自限反应序列中使用双官能单体,以通过分子层控制来生长保形聚合物膜。在这项研究中,对苯二甲酰氯(TC)和对苯二胺(PD)被用作双功能单体,以沉积聚对苯二甲酰对苯二酰胺(PPTA)薄膜。在PPTA MLD之前,使用3-氨丙基三甲氧基硅烷或乙醇胺制备胺端基表面。使用原位透射傅里叶变换红外(FTIR)光谱实验研究了SiO2颗粒高表面积粉末在145摄氏度下PPTA MLD的表面化学性质和生长速率。还使用在原位透射FTIR实验中在带有胺封端的Al2O3 ALD覆盖层的平坦KBr基板上检查了145℃下PPTA MLD薄膜的生长。测量了N-H和酰胺I拉伸振动的积分吸光度,并将其用于估算薄膜厚度。还使用X射线反射率(XRR)实验在145摄氏度和180摄氏度下测量PPTA MLD之后的膜厚度。揭示TC和PD反应显示出自限表面化学性质。表面物质交替出现连续的TC和PD暴露,PPTA MLD薄膜持续增长。但是,在145摄氏度时,每个MLD循环的增长率低于基于反应化学中涉及的分子大小的预期值,并且在每个TC / PD反应循环中的0.5至4:0埃之间变化。较低的生长速率可以通过基材上有限数量的聚合物链的生长来解释。增长率的可变性归因于双官能单体前体的困难。提出了用于聚合物MLD的替代表面化学方法,其将避免使用双官能单体。

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