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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Adsorption of CdSe nanoparticles to thiolated TiO2 surfaces: Influence of intralayer disulfide formation on CdSe surface coverage
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Adsorption of CdSe nanoparticles to thiolated TiO2 surfaces: Influence of intralayer disulfide formation on CdSe surface coverage

机译:CdSe纳米颗粒对硫醇化TiO2表面的吸附:层内二硫化物形成对CdSe表面覆盖的影响

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摘要

Mixed monolayers of hexadecanoic acid (HDA) and 16-mercaptobexadecanoic acid (MHDA) were adsorbed to nanocrystalline TiO2 films, and CdSe nanoparticles were attached to the mixed monolayer functionalized surfaces. IR absorption spectroscopy was used to characterize the equilibrium binding of HDA and MHDA to TiO2 Surface adduct formation constants (K-ad) of (4 :E 2) x 103 M-1 and (6 :L 4) x 103 M-1 were measured for HDA and MHDA, respectively. CdSe nanoparticles were adsorbed to the terminal thiol groups of MHDA. The surface coverage of CdSe was greater on mixed monolayers, consisting of approximately 12% MHDA and 88% HDA, than on pure MHDA monolayers. A mechanism is proposed wherein intralayer disulfide formation between MHDA thiol groups causes decreased reactivity toward CdSe nanoparticles. Disulfide formation is less significant at low fractional surface coverages of MHDA. The mechanism is supported by an increase of CdSe adsorption upon chemical reduction of surface disulfides to thiols. Our findings highlight the effect of intermolecular interactions on the affinity of nanoparticles for monolayer-functionalized surfaces.
机译:十六烷酸(HDA)和16-巯基十八碳二烯酸(MHDA)的混合单层被吸附到纳米TiO2薄膜上,并且CdSe纳米粒子被附着到混合的单层功能化表面上。 IR吸收光谱法用于表征HDA和MHDA与TiO2的平衡结合。(4:E 2)x 103 M-1和(6:L 4)x 103 M-1的表面加合物形成常数(K-ad)为分别针对HDA和MHDA进行了测量。 CdSe纳米粒子被吸附到MHDA的末端巯基上。与纯MHDA单层相比,CdSe的表面覆盖率在混合单层(由大约12%MHDA和88%HDA组成)上更大。提出了一种机制,其中MHDA巯基之间的层内二硫键形成导致对CdSe纳米颗粒的反应性降低。在MHDA的低分数表面覆盖率下,二硫化物的形成不太重要。该机理由表面二硫化物化学还原成硫醇时CdSe吸附增加所支持。我们的发现突出了分子间相互作用对纳米粒子对单层功能化表面的亲和力的影响。

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