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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Characterization of molecular linkages placed between zeolite microcrystal monolayers and a substrate with X-ray reflectivity
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Characterization of molecular linkages placed between zeolite microcrystal monolayers and a substrate with X-ray reflectivity

机译:具有X射线反射率的分子筛在分子筛微晶单分子层和基底之间的表征

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摘要

We prepared silicalite-1 microcrystal (MC) monolayers on a Si wafer using two different types of molecular linkages, namely, through chloropropyl (CP) groups and through CP/polyethylene imine/CP groups. Whereas the scanning electron microscope images of the two MC monolayers look very much alike but hardly give any information on the nature of molecular linkage between the monolayers and the substrate, their reflectivity curves are distinctively different, despite the fact that the thicknesses of the molecular linkage layers (similar to 10-20 angstrom) are negligibly small compared to the thicknesses of MC monolayers, (similar to 3200 angstrom). On the basis of the atomic force microscopic images of the MC surfaces, a rough surface layer with the thickness of similar to 160 angstrom was introduced onto the surface of each MC to conduct a meaningful simulation of the curves with the recursive Parratt formalism. The obtained thickness, roughness, and density of each layer were reasonable, indicating that X-ray reflectivity is a very useful tool for the characterization of very thin layers of molecular linkages existing between much thicker MC monolayers and the substrate.
机译:我们使用两种不同类型的分子键,即通过氯丙基(CP)基团和通过CP /聚乙烯亚胺/ CP基团,在硅片上制备了silicalite-1微晶(MC)单层。尽管两个MC单层的扫描电子显微镜图像看起来非常相似,但几乎没有提供任何有关单层与基材之间分子键性质的信息,但是尽管分子键的厚度不同,但它们的反射率曲线却截然不同。与MC单层的厚度(约3200埃)相比,硅层(约10-20埃)的厚度可以忽略不计。根据MC表面的原子力显微图像,将厚度类似于160埃的粗糙表面层引入到每个MC的表面上,以递归的Parratt形式对曲线进行有意义的模拟。所获得的每一层的厚度,粗糙度和密度是合理的,这表明X射线反射率是表征存在于更厚的MC单层和基底之间的分子键的非常薄的层的非常有用的工具。

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