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Multi-channel Andreev reflection in Co-W nanocontacts fabricated using focused electron/ion beam induced deposition

机译:使用聚焦电子/离子束诱导沉积制备的Co-W纳米接触中的多通道Andreev反射

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摘要

We report multi-channel electron transport in nano-contacts fabricated using focused electron beam induced deposited (FEBID) cobalt and focused ion beam induced deposited (FIBID) tungsten. Anomalous Andreev reflection (AR) effect is observed to which the conventional Blonder-Tinkham-Klapwijk (BTK) fit cannot be applied. In specific, we have observed multiple number of shoulders near the AR peak, whose origin is unknown in literature. We explain this effect based on a simple model that takes into account the material properties of the FIBID grown W superconductor, as well as the specific interface properties that are an outcome of using FEBID/FIBID as a fabrication technique. We show that numerical calculations using the BTK approximation based on the consideration of multiple channels generate similar shoulders as we observed in the AR experiments. Electrical measurements and x-ray photoemission spectroscopy carried out on FIBID W deposits puts additional evidence towards multi-channel current transport occuring at the interface of the nanocontacts.
机译:我们报告在纳米接触中使用聚焦电子束诱导沉积(FEBID)钴和聚焦离子束诱导沉积(FIBID)钨制造的多通道电子传输。观察到异常的安德烈耶夫反射(AR)效果,无法应用常规的Blonder-Tinkham-Klapwijk(BTK)拟合。具体来说,我们观察到AR峰附近有多个肩峰,其起源在文献中是未知的。我们基于一个简单的模型解释了这种影响,该模型考虑了FIBID生长的W超导体的材料特性以及使用FEBID / FIBID作为制造技术的结果所产生的特定界面特性。我们表明,使用基于多通道考虑的BTK近似进行的数值计算会产生与我们在AR实验中观察到的相似的肩峰。对FIBID W沉积物进行的电学测量和X射线光电子能谱分析为在纳米触点界面处发生多通道电流传输提供了更多证据。

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