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首页> 外文期刊>Nanotechnology >High frequency top-down junction-less silicon nanowire resonators
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High frequency top-down junction-less silicon nanowire resonators

机译:高频自上而下无结的硅纳米线谐振器

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摘要

We report here the first realization of top-down silicon nanowires (SiNW) transduced by both junction-less field-effect transistor (FET) and the piezoresistive (PZR) effect. The suspended SiNWs are among the smallest top-down SiNWs reported to date, featuring widths down to ~20 nm. This has been achieved thanks to a 200 mm-wafer-scale, VLSI process fully amenable to monolithic CMOS co-integration. Thanks to the very small dimensions, the conductance of the silicon nanowire can be controlled by a nearby electrostatic gate. Both the junction-less FET and the previously demonstrated PZR transduction have been performed with the same SiNW. These self-transducing schemes have shown similar signal-to-background ratios, and the PZR transduction has exhibited a relatively higher output signal. Allan deviation (σ_A) of the same SiNW has been measured with both schemes, and we obtain σ_A ~ 20 ppm for the FET detection and σ_A ~ 3 ppm for the PZR detection at room temperature and low pressure. Orders of magnitude improvements are expected from tighter electrostatic control via changes in geometry and doping level, as well as from CMOS integration. The compact, simple topology of these elementary SiNW resonators opens up new paths towards ultra-dense arrays for gas and mass sensing, time keeping or logic switching systems on the SiNW-CMOS platform.
机译:我们在这里报告通过无结场效应晶体管(FET)和压阻(PZR)效应转导的自上而下的硅纳米线(SiNW)的第一个实现。悬浮的SiNW是迄今为止报道的最小的自上而下的SiNW之一,其宽度低至约20 nm。这要归功于完全适用于单片CMOS共集成的200毫米晶圆级VLSI工艺。由于尺寸非常小,可以通过附近的静电门控制硅纳米线的电导。无结FET和先前展示的PZR转导都使用相同的SiNW进行。这些自转换方案显示出相似的信噪比,PZR转换显示出相对较高的输出信号。两种方案都测量了同一SiNW的Allan偏差(σ_A),在室温和低压下,FET检测的σ_A〜20 ppm,PZR检测的σ_A〜3 ppm。通过更严格的静电控制,通过改变几何形状和掺杂水平,以及通过CMOS集成,有望实现数量级的改善。这些基本的SiNW谐振器的紧凑,简单的拓扑结构为SiNW-CMOS平台上的气体和质量传感,时间保持或逻辑切换系统的超致密阵列开辟了新途径。

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