...
首页> 外文期刊>Nanotechnology >A general approach for high yield fabrication of CMOS-compatible all-semiconducting carbon nanotube field effect transistors
【24h】

A general approach for high yield fabrication of CMOS-compatible all-semiconducting carbon nanotube field effect transistors

机译:高产量制造兼容CMOS的全半导体碳纳米管场效应晶体管的通用方法

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

We report strategies to achieve both high assembly yield of carbon nanotubes at selected positions of the circuit via dielectrophoresis (DEP) and field effect transistor (FET) yield using an aqueous solution of semiconducting-enriched single-walled carbon nanotubes (s-SWNTs). When the DEP parameters were optimized for the assembly of individual s-SWNTs, 97% of the devices showed FET behavior with a maximum mobility of 210cm 2V ~1s ~1, onoff current ratio 10 6 and on-conductance up to 3νS, but with an assembly yield of only 33%. As the DEP parameters were optimized so that one to five s-SWNTs are connected per electrode pair, the assembly yield was almost 90%, with 90% of these assembled devices demonstrating FET behavior. Further optimization gave an assembly yield of 100% with up to 10 SWNTs per site, but with a reduced FET yield of 59%. Improved FET performance including higher current onoff ratio and high switching speed were obtained by integrating a local Al _2O _3 gate to the device. Our 90% FET with 90% assembly yield is the highest reported so far for carbon nanotube devices. Our study provides a pathway which could become a general approach for the high yield fabrication of complementary metal oxide semiconductor (CMOS)-compatible carbon nanotube FETs.
机译:我们报告了通过介电泳(DEP)在电路的选定位置上实现碳纳米管的高组装成品率以及使用富含半导体的单壁碳纳米管(s-SWNTs)的水溶液实现场效应晶体管(FET)成品率的策略。当针对单个s-SWNT的组装优化DEP参数时,97%的器件表现出FET行为,最大迁移率为210cm 2V〜1s〜1,通断电流比为10 6,导通电导率高达3νS,但具有组装良率仅为33%。由于优化了DEP参数,使得每个电极对连接一到五个s-SWNT,组装效率几乎达到90%,其中90%的组装器件证明了FET的性能。进一步的优化使装配良率达到100%,每个站点最多10个SWNT,但FET良率降低了59%。通过将局部Al _2O _3栅极集成到器件,获得了更高的FET性能,包括更高的电流通断比和更高的开关速度。我们的90%FET和90%的组装良率是迄今为止碳纳米管器件中报道的最高值。我们的研究提供了一种可能成为互补金属氧化物半导体(CMOS)兼容的碳纳米管FET高产量制造的通用方法的途径。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号