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Nanofilamentary resistive switching in binary oxide system; A review on the present status and outlook

机译:二元氧化物系统中的纳米丝电阻切换;审查现状和前景

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摘要

This review article summarized the recent understanding of resistance switching (RS) behavior in several binary oxide thin film systems. Among the various RS materials and mechanisms, TiO_2 and NiO thin films in unipolar thermo-chemical switching mode are primarily dealt with. To facilitate the discussions, the RS was divided into three parts; electroforming, set and reset steps. After short discussions on the electrochemistry of 'electrolytic' oxide materials, the general and peculiar aspects of these RS systems and mechanism are elaborated. Although the RS behaviors and characteristics of these materials are primarily dependent on the repeated formation and rupture of the conducting filaments (CFs) at the nanoscale at a localized position, this mechanism appears to offer a basis for the understanding of other RS mechanisms which were originally considered to be irrelevant to the localized events. The electroforming and set switching phenomena were understood as the process of CF formation and rejuvenation, respectively, which are mainly driven by the thermally assisted electromigration and percolation (or even local phase transition) of defects, while the reset process was understood as the process of CF rupture where the thermal energy plays a more crucial role. This review also contains several remarks on the outlook of these resistance change devices as a semiconductor memory.
机译:这篇综述文章总结了对几种二元氧化物薄膜系统中电阻切换(RS)行为的最新理解。在各种RS材料和机理中,主要涉及单极性热化学转换模式的TiO_2和NiO薄膜。为了便于讨论,RS分为三个部分:电铸,设置和重置步骤。在简短讨论“电解”氧化物材料的电化学之后,详细阐述了这些RS系统和机理的一般方面和特殊方面。尽管这些材料的RS行为和特性主要取决于局部位置的纳米级导电丝(CF)的重复形成和破裂,但这种机理似乎为理解其他最初的RS机制提供了基础。被认为与本地化事件无关。电铸和凝固转换现象分别被理解为CF的形成和再生过程,其主要由缺陷的热辅助电迁移和渗滤(甚至局部相变)驱动,而重置过程被理解为C的过程。 CF破裂处的热能起着至关重要的作用。这篇综述还对这些电阻变化器件作为半导体存储器的前景作了一些评论。

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