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Evolution of microstructure of epoxy coating during UV degradation progress studied by slow positron annihilation spectroscopy and electrochemical impedance spectroscopy

机译:慢正电子hil没光谱和电化学阻抗谱研究紫外光降解过程中环氧涂层微观结构的演变。

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摘要

Evolution of chemical functional groups, microstructure and water barrier properties of a polyamidecured epoxy (diglycidyl ether of bisphenol-A epoxy resin, DGEBA) coating during ultraviolet A (UV-A) photo-oxidative aging is systematically investigated. At the early stage of aging, decrements of S parameter and water uptake coefficient indicate the formation of a more compact structure induced by the post-curing process. After 208 hours (h) of UV irradiation, a novel time constant at relatively high frequency (3.5 × 10~2 Hz) appears in the electrochemical impedance spectroscopy (EIS) spectra suggesting that a microporous layer generates near the surface of DGEBA film. With the increase in irradiation time, overlap of two time constants at frequencies around 18 Hz and 3.7 × 10~3 Hz is observed after 1.33 h of immersion, indicating that the micropores grow towards the bulk and form more characteristic layers with microporous structures. After irradiation for 399 h, a low S parameter region near the sample surface is observed, which implies that a surface layer with low free volume may have formed. With longer exposure, EIS results also reveal that the water barrier property of the coating can be improved, which confirms the formation of the denser surface layer near the surface as a result of radical recombination during UV-A treatment.
机译:系统地研究了聚酰胺固化的环氧树脂(双酚A环氧树脂的二缩水甘油醚,DGEBA)在紫外线A(UV-A)光氧化老化过程中的化学官能团,微观结构和阻水性能的变化。在老化的早期阶段,S参数和吸水系数的降低表明后固化过程会导致形成更致密的结构。经过208小时(h)的紫外线照射后,电化学阻抗谱(EIS)光谱中出现了一个相对较高的频率(3.5×10〜2 Hz)的新时间常数,表明在DGEBA膜表面附近产生了微孔层。随着辐照时间的增加,浸入1.33 h后,在18 Hz和3.7×10〜3 Hz附近的频率处观察到两个时间常数的重叠,表明微孔朝着主体生长并形成具有微孔结构的更多特征层。照射399 h后,在样品表面附近观察到低S参数区域,这意味着可能形成了具有低自由体积的表面层。使用更长的曝光时间,EIS结果还表明可以改善涂层的阻水性能,这证实了在UV-A处理过程中自由基复合的结果是在表面附近形成了致密的表面层。

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