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Directional tendencies of halogen and hydrogen bonds

机译:卤素和氢键的方向性

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Halogen bonding, RAX?B, and hydrogen bonding, RAH?B, are electrostatically-driven noncovalent interactions of covalently-bonded halogens RAX and hydrogens RAH with negative sites B. A significant difference between halogen and hydrogen bonding is that the former is typically near-linear (the R-X-B angles are close to 180°), whereas the latter is more likely to be nonlinear (R-H-B angles sometimes considerably less than 180°). In this work, we have looked at the properties of several RABr?B and RAH?B complexes as functions of these angles. The differences in the directional tendencies in these interactions can be attributed to the presence of nonbonding valence electrons on the bromines, and their absence on hydrogen. We also found that for a given negative site, the halogen and hydrogen bonding interaction energies correlate very well with the positive electrostatic potentials created at it by RAX and RAH. This attests to the electrostatically-driven nature of these interactions. Overall, this study provides support for regarding both halogen and hydrogen bonding as subsets of α-hole interactions.
机译:卤素键RAX?B和氢键RAH?B是共价键合的卤素RAX和氢RAH带有负位B的静电驱动非共价相互作用。卤素键和氢键之间的显着区别是前者通常接近-线性(RXB角接近180°),而后者更可能是非线性的(RHB角有时大大小于180°)。在这项工作中,我们研究了几种RABr?B和RAH?B配合物作为这些角度的函数的性质。这些相互作用中方向性趋势的差异可归因于溴上存在非键合价电子,而氢上不存在电子。我们还发现,对于给定的负位,卤素和氢键相互作用能与RAX和RAH在其处产生的正静电势非常相关。这证明了这些相互作用的静电驱动性质。总体而言,这项研究为将卤素键和氢键视为α-空穴相互作用的子集提供了支持。

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