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Temperature field analysis of single layer TiO_(2) film components induced by long-pulse and short-pulse lasers

机译:长脉冲和短脉冲激光诱导的单层TiO_(2)薄膜组分的温度场分析

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摘要

To study the differences between the damaging of thin film components induced by long-pulse and short-pulse lasers, a model of single layer TiO_(2) film components with platinum high-absorptance inclusions was established. The temperature rises of TiO_(2) films with inclusions of different sizes and different depths induced by a 1 ms long-pulse and a 10 ns short-pulse lasers were analyzed based on temperature field theory. The results show that there is a radius range of inclusions that corresponds to high temperature rises. Short-pulse lasers are more sensitive to high-absorptance inclusions and long-pulse lasers are more easily damage the substrate. The first-damage decision method is drawn from calculations.
机译:为了研究长脉冲和短脉冲激光引起的薄膜组件损伤之间的差异,建立了含铂高吸收率夹杂物的单层TiO_(2)薄膜组件模型。基于温度场理论,分析了由1 ms长脉冲和10 ns短脉冲激光引起的具有不同尺寸和不同深度的夹杂物的TiO_(2)薄膜的温升。结果表明,夹杂物存在一个半径范围,对应于高温上升。短脉冲激光对高吸收率夹杂物更敏感,而长脉冲激光则更容易损坏基板。通过计算得出第一伤害判定方法。

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