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Tightly focused epimicroscope technique for submicrometer-resolved highly sensitive refractive index measurement of an optical waveguide

机译:紧密聚焦的表观显微镜技术,用于亚微米分辨的光波导的高灵敏度折射率测量

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摘要

We introduce a very sensitive new configuration, to the best of our knowledge, in an optical microscope system that utilizes two detectors: one is to measure the power of a low reflected signal from a sample, and the other is only to monitor the confocal geometry of the system. With this new configuration, we could effectively remove measurement noise associated with small perturbation in measurement conditions such as surface curvature, tilt, and vibration in a microscope system. We have obtained a high-resolution relative index precision of 9 X 10~(-5) by employing this novel technique with two detectors.
机译:据我们所知,我们在一个光学显微镜系统中引入了一种非常敏感的新配置,该系统使用两个检测器:一个用于测量样品中低反射信号的功率,另一个仅用于监视共焦几何形状。系统的。通过这种新配置,我们可以有效地消除与显微镜条件下诸如表面曲率,倾斜和振动等测量条件下的微小扰动相关的测量噪声。通过将这种新颖技术与两个检测器结合使用,我们获得了9 X 10〜(-5)的高分辨率相对折射率精度。

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