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Reliable Metal Deposition into TiO2 Nanotubes for Leakage-Free Interdigitated Electrode Structures and Use as a Memristive Electrode

机译:可靠的金属沉积到TiO2纳米管中以实现无泄漏的叉指式电极结构并用作忆阻电极

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摘要

Over the past decades, electrodeposition into ordered nano-porous, nanochanneled, or nanotubular substrates has been widely explored and exploited. In this regard, the use of ordered oxide or polymer membranes with pore diameters in the nanometer range as a template for the fabrication of metal or semiconductor nanowires or nanotubes (NTs) is most straightforward. In these cases, deposition is mostly followed by a selective dissolution of the template to obtain a freestanding array of the ID material of interest. Such attempts were pioneered by the groups of Uosaki, Martin, Masuda, Moskovits, and Gosele, who mostly used self-organized porous alumina or track-etched polycarbonate membranes as templates.
机译:在过去的几十年中,已经广泛地探索和开发了电沉积到有序的纳米多孔,纳米通道或纳米管基质中的方法。在这方面,最直接地使用孔径在纳米范围内的有序氧化物或聚合物膜作为模板来制造金属或半导体纳米线或纳米管(NT)。在这些情况下,沉积之后主要是模板的选择性溶解,以获得感兴趣的ID材料的独立阵列。这种尝试是由Uosaki,Martin,Masuda,Moskovits和Gosele小组发起的,他们大多使用自组织的多孔氧化铝或经轨迹蚀刻的聚碳酸酯膜作为模板。

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