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Zener Tunneling and Photoresponse of a WS2/Si van der Waals Heterojunction

机译:WS2 / Si van der Waals异质结的齐纳隧穿和光响应

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Van der Waals heterostructures built from two-dimensional materials on a conventional semiconductor offer novel electronic and optoelectronic properties for next generation information devices. Here we report that by simply stacking a vapor-phase-synthesized multilayer n-type WS2 film onto a p-type Si substrate, a high-responsivity Zener photodiode can be achieved. We find that above a small reverse threshold voltage of 0.5 V, the fabricated hetero-junction exhibits Zener tunneling behavior which was confirmed by its negative temperature coefficient of the breakdown voltage. The WS2/Si heterojunction working in the Zener breakdown regime shows a stable and linear photoresponse, a broadband photoresponse ranging from 340 to 1100 nm with a maximum photoresponsivity of 5.7 A/W at 660 nm and a fast response speed of 670 Its. Such high performance can be attributed to the ultrathin depletion layer involved in the WS2/Si p-n junction, on which a strong electric field can be created even with a small reverse voltage and thereby enabling an efficient separation of the photogenerated electron hole pairs.
机译:由二维材料在常规半导体上构建的范德华异质结构为下一代信息设备提供了新颖的电子和光电特性。在这里我们报告说,通过简单地将气相合成的多层n型WS2膜堆叠到p型Si衬底上,可以实现高响应性的齐纳光电二极管。我们发现,在0.5 V的较小反向阈值电压以上,所制造的异质结显示出齐纳隧穿行为,这由其击穿电压的负温度系数所证实。在齐纳击穿状态下工作的WS2 / Si异质结显示出稳定且线性的光响应,宽带光响应范围为340至1100 nm,在660 nm处的最大光响应为5.7 A / W,快速响应速度为670 It。如此高的性能归因于WS2 / Si p-n结中涉及的超薄耗尽层,即使在反向电压较小的情况下,也可以在其上形成强电场,从而能够有效分离光生电子空穴对。

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