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首页> 外文期刊>Chemistry Letters >Selective Si-Si Bond Cleavage of Decaisopropylbicyclo[2.2.0]hexasilane with Hydrobromic Acid and Hydrochloric Acid
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Selective Si-Si Bond Cleavage of Decaisopropylbicyclo[2.2.0]hexasilane with Hydrobromic Acid and Hydrochloric Acid

机译:十异丙基双环[2.2.0]六硅烷与氢溴酸和盐酸的选择性Si-Si键裂解

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摘要

In the reactions of decaisopropylbicyclo[2.2.0]hexasilane (1) with hydrobromic acid and hydrochloric acid, the bridgehead Si-Si bond of 1 was selectively cleaved to give 1-halo-1,2,2,3,3,4,5,5,6,6-decaisopropylcyclohexasilanes. The X-ray crystallographic analysis of the products indicates that the cis-addition of the acids to the Si-Si bond is preferable.
机译:在十异丙基双环[2.2.0]六硅烷(1)与氢溴酸和盐酸的反应中,选择性地裂解1的桥头Si-Si键,得到1-卤代1,2,2,3,3,4, 5,5,6,6-十异丙基环六硅烷。产物的X射线晶体分析表明,将酸顺式加成到Si-Si键上是优选的。

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