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首页> 外文期刊>Chemical Weekly >Evonik's Japanese jv breaks ground for integrated monosilane and fumed silica plant
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Evonik's Japanese jv breaks ground for integrated monosilane and fumed silica plant

机译:赢创的日本合资企业为一体化甲硅烷和气相二氧化硅工厂奠基

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摘要

Evonik Industries AG and its partner Taiyo Nippon Sanso Corporation (TNSC) in Japan recently broke ground for the beginning of construction on an integrated production plant for monosilane and Aerosil fumed silica Yokkaichi, for which around ?150-mn has been earmarked. The plant is scheduled for commissioning is scheduled for 2011. TNSC and Evonik signed the agreement to implement the project in May of this year, despite the worldwide economic crisis.
机译:赢创工业股份公司及其合作伙伴日本太阳三山株式会社(TNSC)最近为在甲乙硅烷和Aerosil气相法二氧化硅四日市一厂的综合生产工厂中动工而动工,已预留了约1.5亿欧元。该工厂计划于2011年投入试运行。尽管全球经济危机,TNSC和赢创还是在今年5月签署了实施该项目的协议。

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