首页> 外文期刊>Порошковая Металлургия >PREPARATION OF HIGH-PURITY ULTRAFINE COPPER POWDER IN MASS-PRODUCTION BY CHEMICAL REDUCTION METHOD: TAGUCHI ROBUST DESIGN OPTIMIZATION
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PREPARATION OF HIGH-PURITY ULTRAFINE COPPER POWDER IN MASS-PRODUCTION BY CHEMICAL REDUCTION METHOD: TAGUCHI ROBUST DESIGN OPTIMIZATION

机译:化学减量法制备高纯度超细铜粉的生产:田口健壮设计优化

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摘要

The Taguchi robust design method is implemented for the optimization of experimental conditions in the synthesis of high-purity ultrafine copper powder (HUCP) in mass-production by the chemical reduction method. A reducing agent, reaction temperature, reducing agent weight, and a stirring rate are chosen as the major optimization factors arid the conversion rate, particle size, and reaction time are chosen as the desired targets. It is established that the reducing agent and the reaction temperature are the most significant factors that affect the desired targets. Among the selected or designed factors, the optimal conditions for producing the HUCP are: NaH_2PO_2·H_2O as the reducing agent (level 2), temperature 70℃ (level 3), a reducing agent weight of 8.14 kg (level 3), and a stirring rate 300 rpm (level 2). The study results for the three desired targets are in agreement with the prediction made by the Taguchi method. Furthermore, the pure (impurity <0.06%) face-centered cubic structure of the HUCP with 1.51 pm average particle size is extensively characterized and determined by inductively coupled plasma-optical emission spectrometer (ICP-OES), laser particle-size analyzer (DLS), scanning electron microscopy (SEM), and X-ray diffraction (XRD) analysis. This surfactant-free facility method is suitable for the synthesis of high-purity ultrafine copper powder by mass-production method.
机译:Taguchi鲁棒性设计方法用于优化化学还原法大规模生产合成高纯度超细铜粉(HUCP)的实验条件。选择还原剂,反应温度,还原剂重量和搅拌速率作为主要的优化因素,并选择转化率,粒度和反应时间作为所需目标。已经确定,还原剂和反应温度是影响所需靶标的最重要因素。在选择或设计的因素中,生产HUCP的最佳条件为:NaH_2PO_2·H_2O作为还原剂(2级),温度70℃(3级),重量为8.14 kg(3级)的还原剂和搅拌速度300 rpm(2级)。三个目标目标的研究结果与Taguchi方法所做的预测一致。此外,通过电感耦合等离子体发射光谱仪(ICP-OES),激光粒度分析仪(DLS)对HUCP具有1.51 pm平均粒径的纯(杂质<0.06%)面心立方结构进行了广泛表征和测定。 ),扫描电子显微镜(SEM)和X射线衍射(XRD)分析。这种无表面活性剂的设备方法适用于通过批量生产法合成高纯度超细铜粉。

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