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首页> 外文期刊>日本応用磁気学会誌 >Improvement of Super-RENS MO Disk Characteristics by Optimized Super-Resolution Near-Field Structure
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Improvement of Super-RENS MO Disk Characteristics by Optimized Super-Resolution Near-Field Structure

机译:通过优化的超分辨率近场结构改善Super-RENS MO磁盘特性

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摘要

As a result of applying super-resolution near-field structure to a magneto-optical disk with a non-magnetic mask layer such as a silver oxide light scattering center type mask layer, we could retrieve the signals of below 200-nm mark length. With the improved antimony transparent aperture type mask layer, in this work, we could get the polarized magneto-optical signals as well that we had not been able to obtain by using the previous antimony mask layer. This was well agreed with computer simulation result. Another optimization, such as magnetic layer thickness, dielectric materials and so on, was also investigated for a better magneto-optical disk of super-resolution near-field stricture with a silver oxide light scattering center type mask layer.
机译:通过对具有非磁性掩膜层(例如氧化银光散射中心型掩膜层)的磁光盘应用超分辨率近场结构,我们可以检索标记长度小于200 nm的信号。通过改进的锑透明孔型掩模层,在这项工作中,我们还可以获得极化的磁光信号,而这是使用以前的锑掩模层无法获得的。这与计算机仿真结果完全吻合。还研究了另一种优化方法,例如磁性层厚度,介电材料等,以更好的具有高分辨率的,具有氧化银光散射中心型掩模层的超分辨率近场结构的磁光盘。

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