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Soft Magnetic Properties and Microstructure of NiFe/FeCo/NiFe Thin Films with Large Saturation Magnetization

机译:大饱和磁化强度的NiFe / FeCo / NiFe薄膜的软磁性能和微观结构

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摘要

The soft magnetic properties of NiFe/FeCo/NiFe sandwich films with high saturation magnetization are discussed in relation to the microstructure. Ta/NiFe/FeCo/NiFe/Ta films prepared using the UHV sputtering process show bcc-(110) preferred grain orientation with the <110> direction sharply perpendicular to the film plane in the FeCo layer. It was revealed that thin NiFe film with a thickness of only 3nm works effectively as a seed layer of FeCo film on control the microstructure, resulting in a significant reduction of the coercivity. The best thickness of the FeCo layer in order to realize both soft magnetic properties and high saturation magnetization was found to be approx 100nm. Film deposition in Ar+N_2 plasma reduced the grain size, but did not lead to further improvement of the soft magnetic properties. The large lattice strain induced by N_2 addition is likely to degrade the soft magnetic properties.
机译:讨论了具有高饱和磁化强度的NiFe / FeCo / NiFe夹层膜的软磁性能。使用UHV溅射工艺制备的Ta / NiFe / FeCo / NiFe / Ta膜表现出bcc-(110)较好的晶粒取向,其中<110>方向与FeCo层中的膜平面垂直。结果表明,厚度仅为3nm的NiFe薄膜可以有效地作为FeCo薄膜的晶种层,从而控制了微观结构,从而显着降低了矫顽力。为了实现软磁性能和高饱和磁化强度,FeCo层的最佳厚度约为100nm。在Ar + N_2等离子体中的膜沉积减小了晶粒尺寸,但并未导致软磁性能的进一步改善。 N_2添加引起的大晶格应变可能会降低软磁性能。

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