Seals used for semiconductor manufacturing devices

摘要

In the semiconductor manufacturing, various kinds of gases and liquids have been used under vacuum condition and irradiation of plasma. Accordingly, seals used for semiconductor manufacturing devices were required low leakage under vacuum condition, and also good resistance for chemicals, plasma and high temperature. Corresponding to such needs, various kinds of metal and rubber seals were developed by using our technology. In the metal seals, an ultra lapping Metal-O-Ring for mass flow controller, SUNCUP for integrated gas system, and an aluminum jacket seal which suppressed gas permeation were developed. Rubber materials such as SUNELAST I, SUNELAST II, material number 1364-70, and 1349-80 were also developed. Further, TRI seal that uniquely designed for gate valve was created. In this report, characteristics of these newly developed seals were explained.