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首页> 外文期刊>Condensed Matter and Materials Communications >INFLUENCE OF PLASMA NITRIDING OF STEEL SUBSTRATES ON THE PROPERTIES OF TiN AND (Ti, Al) N COATINGS
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INFLUENCE OF PLASMA NITRIDING OF STEEL SUBSTRATES ON THE PROPERTIES OF TiN AND (Ti, Al) N COATINGS

机译:钢基底的等离子渗氮对TiN和(Ti,Al)N涂层的性能的影响

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摘要

The properties of polycrystalline TiN and (Ti, Al)N coatings deposited on not nitrided, conventionally plasma nitrided and low pressure plasma nitrided AISI Hll and AISI M2 steel substrates were investigated. The plasma deposition and low pressure plasma nitriding were performed in a Z700-LH magnetron sputter unit, while separate unit MONO5 was used for conventional plasma nitriding. For the characterisation of the composite structures, the following methods were used: scratch test, X-ray diffract ion analysis, scanning electron microscopy, scanning tunneling microscopy and microhardness measurements. It was found that the plasma nitriding prior to coating deposition strongly affects the growth and properties of hard coatings, such as the microhardness, adhesion, preferred orientation, structure and morphology. Plasma nitriding at low pressure has a greater effect than does conventional plasma nitriding: the adhesion is even more enhanced, the microharness is increased, the preferred orientation is more pronounced and the structure is slill columnar but more compact. All the changes are more clear visible in the case of TiN coating. The influence of the base substrate material on the coating properties is also evident. After plasma nitriding, the structure. morphology and topography of the coatings are less dependent on the steel grade of the substrate.
机译:研究了沉积在未氮化,常规等离子氮化和低压等离子氮化的AISI H11和AISI M2钢基底上的多晶TiN和(Ti,Al)N涂层的性能。等离子体沉积和低压等离子体氮化在Z700-LH磁控溅射装置中进行,而单独的MONO5装置用于常规等离子体氮化。为了表征复合结构,使用了以下方法:划痕测试,X射线衍射分析,扫描电子显微镜,扫描隧道显微镜和显微硬度测量。发现在涂层沉积之前的等离子体氮化强烈地影响了硬涂层的生长和性能,例如显微硬度,粘附性,优选的取向,结构和形态。与常规的等离子体氮化相比,低压等离子体氮化具有更大的效果:附着力甚至进一步增强,微线束增加,优选的取向更加明显,并且结构呈柱状但更致密。在TiN涂层的情况下,所有变化都更加清晰可见。基础基材材料对涂层性能的影响也很明显。等离子渗氮后,结构。涂层的形态和形貌较少依赖于基底的钢种。

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