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首页> 外文期刊>Computational Materials Science >Structural stability, phase transition, and mechanical and electronic properties of transition metal nitrides MN (M = Tc, Re, Os, and Ir): First-principles calculations
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Structural stability, phase transition, and mechanical and electronic properties of transition metal nitrides MN (M = Tc, Re, Os, and Ir): First-principles calculations

机译:过渡金属氮化物MN(M = Tc,Re,Os和Ir)的结构稳定性,相变以及机械和电子性能:第一性原理计算

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The structural stabilities, phase transition, and mechanical and electronic properties of MN (M = Tc, Re, Os, and Ir) with different structures were reported by means of first-principles total energy calculations. The calculations indicate that the NbO-type structure is more energetically preferred for TcN and ReN, and the Pmn2 _1-type structure is more favorable for IrN and OsN. The NbO-type ReN and TcN are stable up to 51.9 and 19.5 GPa, respectively, above which NiAs type structure becomes more energetically favorable. Both NiAs-type ReN and Pmn2 _1-type OsN exhibit excellent mechanical properties due to the strong bonding between M and N atoms, similar to TiN. The electronic structure calculation suggests that the Pmn2 _1-IrN is a semiconductor with an indirect band gap of about 0.38 eV, suggesting the potential technological applications.
机译:通过第一性原理总能量计算,报道了具有不同结构的MN(M = Tc,Re,Os和Ir)的结构稳定性,相变以及机械和电子性能。计算表明,对于TcN和ReN,更优选NbO型结构,而对于IrN和OsN,Pmn2 _1型结构更有利。 NbO型ReN和TcN分别在高达51.9 GPa和19.5 GPa时保持稳定,在此之上,NiAs型结构在能量上更加有利。 NiAs型ReN和Pmn2 _1型OsN都具有极好的机械性能,这是由于M和N原子之间的牢固键合,与TiN相似。电子结构计算表明,Pmn2 _1-IrN是一种半导体,其间接带隙约为0.38 eV,这表明了潜在的技术应用。

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