Stress Analysis of Photoelastic Model Fabricated by Stereolithography

摘要

The experimental results for a photoelastic model fabricated by stereolithography are presented. The stereolithograhy is possible to automate production of the photoelastic model. It is desirable to use stereolithograhy for the automation of the photoelasticity. The fabricated models have many concavities on their surfaces. The influence of surface, residual stresses in the model and applied stresses were quantitatively examined by experiments by a conventional method and an immersion method. Stress analysis is possible in the conventional experiment, despite the intensity varying irregularly in the measured images. In the immersion experiment, the intensity in the measured images is uniform so that the images of the analysis results are clearer than those obtained in the conventional experiment. This demonstrates that models fabricated by stereolithography are useful for photoelastic models.