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首页> 外文期刊>Металлофизика и новейшие технологии: Науч.-теорет. журн. >Glow Discharge Plasma Nitriding of Al 6063 Samples and Study of Their Surface Hardness
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Glow Discharge Plasma Nitriding of Al 6063 Samples and Study of Their Surface Hardness

机译:Al 6063样品的辉光放电等离子体氮化及表面硬度的研究

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Plasma nitriding also knows as ion nitriding or glow discharge plasma nitriding is a method of surface hardening. It is a process by which nitrogen is introduced in the matie4rla, thus changing the surface properties of the material. Usually plasma nitriding is carried under low pressure (i.e. in mbar range), which is called low-pressure plasma nitriding. High voltage dc discharge is used to form plasma through which the nitrogen ions are then accelerated to deposit on the work piece. Depending on the processing conditions i.e. the processing time, discharge current, bias voltage, gas mixture percentage and pressure, the nitriding layer can be changed and accordingly the surface properties can be modified. Gases such as argon,. Hydrogen, etc. Can be used as a catalyst along with nitrogen, which helps in formation of nitride layer. The nitride layer so formed can be of the order of 0.01 to 0.1 #mu#m. As thickness of the nitride layer is increased, surface of the material can be made harder. The hardness of the material surface can be measured using different methods. Here we have measured the hardness using durometer.
机译:等离子渗氮也称为离子渗氮或辉光放电等离子渗氮是一种表面硬化方法。这是将氮引入材料的过程,从而改变了材料的表面性能。通常在低压下(即,在毫巴范围内)进行等离子体氮化,这被称为低压等离子体氮化。高压直流放电用于形成等离子,然后氮离子通过该等离子加速以沉积在工件上。取决于处理条件,即处理时间,放电电流,偏置电压,气体混合物百分比和压力,可以改变渗氮层并因此可以改变表面性质。氩气等气体。氢等可以与氮一起用作催化剂,这有助于形成氮化物层。如此形成的氮化物层可以为0.01至0.1#μm。随着氮化物层的厚度增加,可以使材料的表面变硬。可以使用不同的方法来测量材料表面的硬度。在这里,我们使用硬度计测量了硬度。

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