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Physical properties of chemically deposited Sb2S3 thin films

机译:化学沉积Sb2S3薄膜的物理性质

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Semiconducting Sb2S3 thin films were prepared on SnO2:(F)/glass substrates from an aqueous medium using chemical bath techniques at low temperatures (40-70 °C). X-ray diffraction (XRD) shows that the films are well crystallized with the stibnite structure. Scanning electron microscopy (SEM) reveals homogenous and well distributed spherical grains, indicating the formation of uniform thin films. The Sb2S3 films display good optical properties with a direct band gap of about 2.30 eV. The refractive index (n) of the investigated films was determined from optical reflectance data with a value in the range of 2.5 to 3.3.
机译:在低温(40-70°C)下,使用化学浴技术从水性介质在SnO2:(F)/玻璃基板上制备Sb2S3半导体薄膜。 X射线衍射(XRD)显示出具有辉石结构的薄膜充分结晶。扫描电子显微镜(SEM)显示出均匀且分布均匀的球形晶粒,表明形成了均匀的薄膜。 Sb2S3薄膜具有良好的光学性能,直接带隙约为2.30 eV。根据光反射率数据确定被研究膜的折射率(n),该值在2.5至3.3的范围内。

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