首页> 外文期刊>Journal of Thermal Spray Technology >Characterization of Plasma Jet in Plasma Spray-Physical Vapor Deposition of YSZ Using a < 80 kW Shrouded Torch Based on Optical Emission Spectroscopy
【24h】

Characterization of Plasma Jet in Plasma Spray-Physical Vapor Deposition of YSZ Using a < 80 kW Shrouded Torch Based on Optical Emission Spectroscopy

机译:<80 kW笼式炬管基于光发射光谱法对YSZ进行等离子喷涂物理气相沉积中的等离子流表征

获取原文
获取原文并翻译 | 示例
           

摘要

During plasma spray-physical vapor deposition (PS-PVD) of yttria-stabilized zirconia (YSZ) coatings, evaporation of the YSZ powder is essential, but quite difficult when using a commercial < 80 kW plasma torch. In this study, a shrouded plasma torch was examined to improve the YSZ evaporation. The plasma characteristics were diagnosed using optical emission spectroscopy. Results showed that the electron number density in the plasma jet was maintained at an order of magnitude of 10(14) cm(-3), indicating local thermal equilibrium of the plasma jet. Compared with a conventional torch, the shrouded torch resulted in much higher plasma temperature and much lower electron number density. With the shrouded torch, more energy of the plasma was transferred to the YSZ material, leading to more evaporation of the YSZ powder and thereby a much higher deposition rate of the YSZ coating. These results show that use of a shrouded torch is a simple and effective approach to improve the evaporation of feedstock material during PS-PVD.
机译:在氧化钇稳定的氧化锆(YSZ)涂层的等离子喷涂物理气相沉积(PS-PVD)期间,YSZ粉末的蒸发是必不可少的,但是在使用市售的<80 kW等离子炬时非常困难。在这项研究中,检查了带罩的等离子体炬,以改善YSZ蒸发。使用光发射光谱法诊断血浆特征。结果表明,等离子流中的电子数密度保持在10(14)cm(-3)的数量级,表明等离子流的局部热平衡。与传统的焊炬相比,带盖的焊炬导致更高的等离子体温度和更低的电子数密度。使用带盖的割炬,更多的等离子体能量转移到了YSZ材料上,从而导致YSZ粉末更多的蒸发,从而大大提高了YSZ涂层的沉积速率。这些结果表明,使用带罩的割炬是一种简单有效的方法,可以改善PS-PVD期间原料的蒸发。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号