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Electrosynthesis and characterisation of CdSeHgTl thin films

机译:CdSeHgTl薄膜的电合成与表征

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摘要

Thallium containing CdSeHg films have been elect rosynthesised at -0.600 V vs SCE on titanium substrate from the aqueous solution. Electrochemical properties of the films were investigated in I-2/I-redox solution. Films were found to be p-type conductor with charge carrier level 10(25). The carrier concentration, flat band potential of the film were determined from capacitance measurements. The films were characterized with scanning electron microscopy (SEM) combined with energy dispersive X-ray analysis (EDAX) system. The corrosion characteristics of the films have been studied by polarization technique. The inhibitor, inhibits corrosion effectively even in trace amount. This is the study to investigate the effect of thallium concentration on the composition, capacitance, photoactivity, morphology and corrosion parameters of the CdSeHgTI films electrosynthesised by electro deposition.
机译:从水溶液中,在-0.600 V vs SCE上,含钛的CdSeHg薄膜被腐蚀合成。在I-2 / I-氧化还原溶液中研究了薄膜的电化学性能。发现膜是电荷载流子能级为10(25)的p型导体。由电容测量确定载流子浓度,膜的平坦带电势。通过扫描电子显微镜(SEM)结合能量色散X射线分析(EDAX)系统对薄膜进行表征。已经通过极化技术研究了膜的腐蚀特性。该抑制剂即使痕量也能有效抑制腐蚀。这项研究旨在研究concentration浓度对通过电沉积电合成的CdSeHgTI膜的组成,电容,光活性,形态和腐蚀参数的影响。

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