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首页> 外文期刊>Journal of the Korean Physical Society >Temperature Effect of a Si-Doped MgO Protective Layer on the Discharge Characteristics of an AC-PDP
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Temperature Effect of a Si-Doped MgO Protective Layer on the Discharge Characteristics of an AC-PDP

机译:掺杂Si的MgO保护层对AC-PDP放电特性的温度影响

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This article reports misfiring and discharge time lag properties as well as temperature- dependentvoltages and jitter of an AC-PDP, related to the effect of a small amount of Si doping in theMgO protecting layer. In order to improve the high-temperature and low-temperature misfiringand the discharge time lag properties, we used Si-doped MgO pellets while the MgO layer wasbeing deposited on 4-inch test panels by using an electron-beam evaporation method. When thetemperature was much higher or lower than room temperature (20 °C), the voltage differencebetween the sustain voltage Vs and the firing voltage Vf increased. The results can probably beattributed to a change in the secondary electron emission coefficient caused by a change in theenergy band structure and the surface properties. The discharge time lag of the Si-doped MgOlayer with temperature variation is lower with that for pure MgO.
机译:本文报道了AC-PDP的失火和放电时滞特性以及与温度有关的电压和抖动,这与在MgO保护层中掺杂少量Si的影响有关。为了改善高温和低温失火和放电时间延迟特性,我们使用掺Si的MgO颗粒,同时通过电子束蒸发法将MgO层沉积在4英寸的测试板上。当温度远高于或低于室温(20℃)时,维持电压Vs和点火电压Vf之间的电压差增大。结果可能归因于由能带结构和表面性质的变化引起的二次电子发射系数的变化。掺Si的MgO层随温度变化的放电时间滞后要比纯MgO的要小。

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