REFLECTANCE AND OPTICAL ROTATION TECHNIQUES TO STUDY THE NATURE OF SURFACES

摘要

In some of the cases to study the new materials, being exploited for development of newer devices, the materials are prepared in the form of thin films or wafers. In order to study thin films or wafers of the materials one of the powerful techniques is reflectance measurement. Another method may be the study of optical rotation of plane of polarization due to interaction of the incident light with the surface under study. Presently, the angle of rotation 6 of plane of polarization of incidence light beam on reflection from the sample surface at nearly 45° was measured. Also, the reflectance, R of the surfaces under study were measured at normal incidence. In order to establish a relation between R, and e of the surfaces, a graph was plotted in between R and θ. If the value of θ is measured for the test sample surface, its value of R can be estimated and vice-versa with the help of the graph. The distinguished feature of the method is that the samples of diffused nature whose reflectance cannot be measured on reflectometer can be studied with the help of this technique.