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A silicon nitride reference material-A testing program of ESIS TC6

机译:氮化硅参考材料-ESIS TC6测试程序

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摘要

Silicon nitrides with sufficient strength for structural applications have been developed 20 years ago. A break-through in the use of these ceramics for structural applications did not yet take place. Most probably, the reason for this is a significant lack of design relevant data. TC 6 "Ceramics" of the European Structural Integrity Society (ESIS) has established a research program in order to determine a complete set of material properties and data indispensable for design for a commercially available silicon nitride ceramic. The material chosen as the ESIS Silicon Nitride Reference Material is a gas pressure sintered silicon nitride containing approx 3 wt. percent Al_2O_3 and approx 3 wt. percent Y_2O_3. The results available to the present indicate that this specific material has a good mechanical performance at room temperature and up to approx 800 deg C. Above this temperature the large amount of amorphous grain boundary phase causes a detrimental influence on the environmental assisted crack growth properties and the creep performance.
机译:具有足够强度以用于结构应用的氮化硅已在20年前开发出来。这些陶瓷在结构应用中的使用尚未突破。最可能的原因是明显缺乏与设计相关的数据。欧洲结构完整性协会(ESIS)的TC 6“陶瓷”已经建立了一项研究计划,以确定可用于商业氮化硅陶瓷设计的完整材料特性和数据集。被选作ESIS氮化硅参考材料的材料是气压烧结氮化硅,其含量约为3 wt%。 Al_2O_3百分比和约3 wt。 Y_2O_3%。目前可获得的结果表明,这种特定的材料在室温和高达约800摄氏度的温度下具有良好的机械性能。在该温度以上,大量的无定形晶界相对环境辅助的裂纹扩展性能和破坏性产生不利影响。蠕变性能。

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