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首页> 外文期刊>Journal of the European Ceramic Society >Evaluation of texture distribution during the industrial polishing process of porcelain stoneware tiles
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Evaluation of texture distribution during the industrial polishing process of porcelain stoneware tiles

机译:陶瓷stone砖工业抛光过程中纹理分布的评价

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The present work addresses the distribution of texture over the surface of porcelain stoneware tiles due to kinematics imposed by industrial polishing process. The scratching process was simulated using a computational algorithm, which was based on the kinematic equations for the whole myriad of abrasive particles. Different scratching patterns were identified over the polished surface and their corresponding positions were mapped. The experimental results showed that regions in the tile centre present smaller tendencies for exhibiting preferential textures than those of the lateral ones. The final texture was slightly asymmetric and different from those simply left by the last scratches. The definition of three polishing domains was then suggested according to different phenomenological criteria. Results from both experiments and simulations made evident the influence of the kinematic parameters adopted by the industries on the polishing quality of porcelain stoneware tiles.
机译:本工作解决了由于工业抛光过程所产生的运动学因素,导致瓷stone砖表面纹理的分布。使用计算算法对刮擦过程进行了模拟,该算法基于整个无数磨料颗粒的运动方程。在抛光表面上发现了不同的划痕图案,并绘制了它们对应的位置。实验结果表明,瓷砖中心区域比侧面区域具有较小的趋势,以显示优先纹理。最终的纹理略有不对称,与最后的划痕所留下的纹理完全不同。然后根据不同的现象学标准提出了三个抛光域的定义。实验和模拟的结果都表明,工业采用的运动学参数对陶瓷粗陶砖抛光质量的影响。

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