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首页> 外文期刊>Journal of the European Ceramic Society >New manufacturing process for nanometric SiC
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New manufacturing process for nanometric SiC

机译:纳米碳化硅的新制造工艺

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Nanometric ?-SiC powder was prepared by carbothermal reduction of freeze-dried gel. Initially, the gel was obtained by polycondensation of sol consisting of resorcinol and formaldehyde as a source of C and tetraethoxysilane as a source of silicon. The effect of temperature and time of heat treatment (carbothermal reduction) as well as the effect of C/Si ratio on SiC powder properties was studied. It was possible to obtain nanosized (~20 nm) ?-SiC powder after one-hour heat treatment at relatively low temperature of 1200 °C. The powder was successfully synthesised without the need for excess carbon which is typical for conventional carbothermal reduction using some other sources of graphite. The increase in temperature of heat treatment to 1400 °C caused considerable growth of SiC particles up to 400 nm. It was found that prolonged heat treatment at 1200 °C is an effective way to obtain well crystallized SiC and keep the size of SiC particles below 50 nm at the same time.
机译:通过对冻干凝胶进行碳热还原来制备纳米α-SiC粉末。最初,通过将由间苯二酚和甲醛组成的溶胶(作为C源)和四乙氧基硅烷(作为硅源)组成的溶胶进行缩聚而获得凝胶。研究了温度和热处理时间(碳热还原)的影响,以及C / Si比对SiC粉末性能的影响。在1200℃的较低温度下进行一小时的热处理后,可以获得纳米级(〜20nm)的α-SiC粉末。该粉末可以成功合成,而无需使用过量碳,而碳通常是使用其他一些石墨源进行常规碳热还原的典型方法。热处理温度升高到1400°C,导致高达400 nm的SiC颗粒大量生长。发现在1200℃下延长热处理是获得良好结晶的SiC并且同时将SiC颗粒的尺寸保持在50nm以下的有效方法。

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