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首页> 外文期刊>Journal of the European Ceramic Society >Preparation and characterization of Zn~(18)O/Zn~(16)O isotope heterostructure thin films
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Preparation and characterization of Zn~(18)O/Zn~(16)O isotope heterostructure thin films

机译:Zn〜(18)O / Zn〜(16)O同位素异质结构薄膜的制备与表征

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An oxygen isotope-based heterostructure zinc oxide (ZnO) thin film, Zn~(16)O/Zn~(18)O/Zn~(16)O, was made by pulsed laser deposition on an a-face sapphire substrate. The isotope-enriched Zn~(18)O layer was made by irradiation of the isotope oxygen radical (~(18)O*). The isotopic ratio in the heterostructure film was analyzed via secondary ion mass spectroscopy (SIMS). The ratio of exchange from ~(16)O to ~(18)O was approximately 70 percent when the oxygen isotope was irradiated as a radical, while it was approximately 10 percent when the oxygen isotope was supplied as ~(18)O_2 gas.
机译:通过在a面蓝宝石衬底上脉冲激光沉积制备氧同位素基异质结构氧化锌(ZnO)薄膜Zn〜(16)O / Zn〜(18)O / Zn〜(16)O。通过辐照同位素氧自由基(〜(18)O *)制成富含同位素的Zn〜(18)O层。通过二次离子质谱(SIMS)分析异质结构膜中的同位素比率。当将氧同位素作为自由基进行辐照时,〜(16)O与〜(18)O的交换比率约为70%,而当氧同位素作为〜(18)O_2气体提供时,其交换比率约为10%。

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