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首页> 外文期刊>Journal of the European Ceramic Society >Highly loaded UV curable nanosilica dispersions for rapid prototyping applications
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Highly loaded UV curable nanosilica dispersions for rapid prototyping applications

机译:高载紫外光固化纳米二氧化硅分散体,用于快速成型应用

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摘要

Silica microcomponents are attractive for applications requiring high temperature stability and chemical durability such as in microreactors. Rapid prototyping methods of forming ceramic dispersions hold great potential for manufacturing of microreactors. Stereolithography for example can benefit from highly solid loaded, low viscosity and high transparency dispersions. This article presents the development of >40 vol. percent , UV curable transparent silica nanodispersions having viscosities suitable for stereolithography applications. The main parameters enabling these high loading dispersions are minimization of the Van der Waals attractive forces and affinity of monomer end group for the silica surface (e.g. hydrogen bonding). The minimization of the Van der Waals attraction is achieved by refractive index matching of the nanosilica and UV curable acrylate monomers. This results also in highly transparent dispersions having curing depths in the order of 10 mm in the UVA range. The transformation of selected dispersions to self-supporting silica glass sheets through UV curing, debinding and sintering was investigated by TGA/DTA, dilatometry and XRD.
机译:二氧化硅微组分对于要求高温稳定性和化学耐久性的应用(如微型反应器)具有吸引力。形成陶瓷分散体的快速原型方法在制造微反应器方面具有巨大潜力。例如,光刻可以受益于高固含量,低粘度和高透明度的分散体。本文介绍了> 40 vol。百分比的紫外光固化透明二氧化硅纳米分散体,其粘度适合立体光刻应用。使这些高负荷分散体起作用的主要参数是范德华力的最小化和单体端基对二氧化硅表面的亲和力(例如氢键)。范德华引力的最小化是通过纳米二氧化硅和可紫外线固化的丙烯酸酯单体的折射率匹配来实现的。这也导致在UVA范围内具有10mm量级的固化深度的高度透明的分散体。通过TGA / DTA,膨胀法和XRD研究了选定的分散体通过UV固化,脱脂和烧结而转变为自支撑石英玻璃板的过程。

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