Traceable nanometrology with a nanopositioning and nanomeasuring machine

摘要

This article deals with a high-precision three-dimensional positioning and measuring machine. The interferometric length measurement system is able to achieve a resolution of less than 0.1 nm over the entire positioning and measurement range of 25 mm × 25 mm × 5 mm and is traceable to the length standard. The Abbe offset-free design in conjunction with a corner mirror as a reference coordinate system provides extraordinary accuracy. The intersection of all length-measurement axes is the point of contact between the probe and the specimen. The measurement object is placed on a movable corner mirror that is positioned by a three-axis drive system. The position of the corner mirror is measured by three fixed interferometers and used for highly accurate position control. Therefore, translatory errors of the linear guide elements have no influence on the length measurement result. The integration of several probe systems and nanotools makes the nanopositioning and nanomeasuring machine suitable for various tasks, such as large-area scanning probe microscopy, mask and wafer inspection, nanostructuring, biotechnology and genetic engineering as well as measuring mechanical precision. The article gives basic information on this machine and explains its mode of operation and performance.