首页> 外文期刊>Journal of Radioanalytical and Nuclear Chemistry: An International Journal Dealing with All Aspects and Applications of Nuclear Chemistry >The effect of gamma-ray irradiation on the adsorption properties and chemical stability of AMP/SiO2 towards Cs(I) in HNO3 solution
【24h】

The effect of gamma-ray irradiation on the adsorption properties and chemical stability of AMP/SiO2 towards Cs(I) in HNO3 solution

机译:γ射线辐照对HNO3溶液中AMP / SiO2对Cs(I)的吸附性能和化学稳定性的影响

获取原文
获取原文并翻译 | 示例
           

摘要

Silica based ammonium molybdophosphate (AMP/SiO2) adsorbent was used to remove Cs(I) from HNO3 solution. The adsorbent with different absorbed dose (0-300 kGy) was characteristed by X-ray power diffraction. The adsorption data against different gamma-ray absorbed doses were analyzed by the Langmuir isotherm. The adsorption capacity decreased slightly from 23.22 to 22.37 mg/g with the increase of the absorbed dose. The breakthrough properties of Cs(I) were conducted using column packed with AMP/SiO2 before and after irradiation. The chemical stability of AMP/SiO2 at 300 kGy absorbed dose in 3 mol/L (M) HNO3 was excellent.
机译:二氧化硅基钼酸铵(AMP / SiO2)吸附剂用于从HNO3溶液中去除Cs(I)。通过X射线功率衍射表征了不同吸收剂量(0-300 kGy)的吸附剂。通过朗缪尔等温线分析了针对不同γ射线吸收剂量的吸附数据。随着吸收剂量的增加,吸附量从23.22 mg / g略有下降。在照射前后,使用填充有AMP / SiO2的柱进行Cs(I)的穿透性能。在3 mol / L(M)的HNO3中,吸收剂量为300 kGy的AMP / SiO2的化学稳定性非常好。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号