Microphase separation in thin films of supramolecular assemblies composed of a triblock copolymer and low-molecular-weight additive

摘要

The phase behavior of supramolecular assemblies (SMAs) formed by poly(4-vinylpyridine)-block-polystyreneblockpoly(4-vinylpyridine) (P4VP-b-PS-b-P4VP) triblock copolymer with 2-(40-hydroxybenzeneazo)benzoic acid (HABA) was investigated with respect to the molar ratio (X) between HABA and 4VP monomer unit in bulk as well as in thin films. The results were compared with SMAs formed by a PS-b-P4VP diblock copolymer of similar composition as the triblock but half the molecular weight to ascertain the effect of molecular architecture on microphase separation. In bulk, both the di- and triblock SMAs showed composition-dependent morphological transitions, which could be tuned by HABA/4VP molar ratio. The domain spacing of the SMA was not significantly affected by the molecular architecture of the constituting block copolymers. In thin films also, both the di- and triblock SMAs showed more or less similar morphological transitions depending on X. Interestingly, the domain orientation of the cylindrical or lamellar microdomains in the SMAs was influenced by the molecular architecture of the block copolymer. After chloroform annealing, although the diblock SMAs showed in-plane orientation of the domains, triblock SMAs showed perpendicular domain orientation. The perpendicular orientation of the microdomains in triblock was favored because it allowed the mid-PS blocks to acquire normal distribution of loop and bridged conformations. Furthermore, the orientation of the lamellar and cylindrical microdomains of the diblock SMAs was found to switch to perpendicular orientation after annealing in 1,4-dioxane vapors.